IKA Honored with Innovation Leadership Award

 Überlingen – This year, IKA has once again been ranked among the most innovative small and medium-sized enterprises (SMEs) in Germany. The company from Staufen is being honored with a place in the 24th annual TOP 100 of Germany’s most innovative SMEs by Ranga Yogeshwar, Prof. Dr. Nikolaus Franke und compamedia. This is the fourth time the company has been awarded this seal of approval and a place in Germany’s innovation elite. The company’s innovative processes and external focus were key winning factors in the independent selection process.

Throughout the world, there are a lot of chemistry laboratories in which scientists work with and rely on products made by IKA. The four-time TOP 100 winner from Staufen in the Breisgau region of Germany is one of the world’s leading companies in the laboratory, analytical and process equipment segment. The award-winning innovator offers a product portfolio for almost all applications in laboratories in the chemical industry. The company uncompromisingly strives to attain technological leadership in the cause of the advancement of science. To achieve this aim, IKA works in close collaboration with its customers around the globe. One outstanding achievement of this approach is the development of a magnetic hotplate stirrer with a lifetime warranty.

In addition to its commitment to the promotion of open innovation, the family-owned company, founded in 1910, also convinced the jurors with its innovation processes. IKA places a strong emphasis on innovative process organization methods and simultaneously promotes rapid realization of the ideas proposed by its more than 800 employees around the world by the implementation of flat hierarchies and short decision paths. These ideas arise from numerous incentive activities such as, for example, employee exchange programs. As a driver for this long-established spirit of innovation, the owner family Stiegelmann dedicates around 80 percent of its working time to innovative research and development. The success of this policy speaks for itself: around 30 percent of the company’s revenues are earned with products that have been on the market for less than three years.

 

Plasma-Enhanced Chemical Vapor Deposition

PECVD is a fabrication method for depositing thin films on a wafer. PECVD is used to deposit SiO2, Si3N4 (SixNy), SixOyNz and amorphous Si films. Plasma is added in the deposition chamber with reactive gases to create the desired solid surface on the substrate. PECVD allows the creation of highly uniform thin layers, promotes purity and adhesion, and varies compositions on substrates of different materials and geometries. PECVD widely use in optics industry on manufacturing optical filters, anti-reflective films, and devices with an undesired refractive index. Other applications are in electronics and microelectronics, semiconductive or conductivecoating for parts or devices, and in the production of solar cells for surface passivation.  PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system is consists of RF plasma source, precision mass flow meter with gas mixing tank, and mechanical pump.   The PE-CVD furnace is an ideal and affordable tool to deposit thin films or grow nanowire from a gas state (vapor) to a solid state. Benefit of PECVD tube system are lower temperature processing compared to conventional CVD, film stress can be controlled by high/low frequency mixing techniques. Control over stoichiometry via process conditions and offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition.

Sputtering is a Physical Vapor Deposition vacuum process used to deposit very thin films onto a substrate for a wide variety of commercial and scientific purposes. Sputtering occurs when an ionized gas molecule is used to displace atoms of a specific material. These atoms then bond at the atomic level to a substrate and create a thin film. Several types of sputtering processes exist, including ion beam, diode, and magnetron sputtering. Angstrom Sciences specializes in Magnetron Sputtering Technology. High Vacuum Mini Co-Sputtering System specifically designed for R&D laboratory and pilot production applications and capable of uniform deposition of ≦±5% (center-to-edge). It is designed with compact integrated design and high-speed turbopump is built-in. The sputtering system can be applied to a various application such as in aerospace & defense, automotive and optic industries.

Plasma-Enhanced Chemical Vapor Deposition (PECVD) is a fabrication method for depositing thin films on a wafer. PECVD is used to deposit SiO2, Si3N4 (SixNy), SixOyNz and amorphous Si films. Plasma is added in the deposition chamber with reactive gases to create the desired solid surface on the substrate. PECVD allows the creation of highly uniform thin layers, promotes purity and adhesion, and varies compositions on substrates of different materials and geometries.

PECVD is widely used in optics industry on manufacturing optical filters, anti-reflective films, and devices with an undesired refractive index. Other applications are in electronics and microelectronics, semiconductive or conductivecoating for parts or devices, and in the production of solar cells for surface passivation. PECVD tube furnace system consists of RF plasma source, precision mass flow meter with gas mixing tank, and mechanical pump.

The PECVD furnace is an ideal and affordable tool to deposit thin films or grow nanowire from a gas state (vapor) to a solid state. Benefit of PECVD tube system are lower temperature processing compared to conventional CVD, film stress can be controlled by high/low frequency mixing techniques. Control over stoichiometry via process conditions and offers a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon (a-Si:H) deposition.

This article is brought to you by PT KGC Saintifik. Visit them at booth B14 this April to find out more about the PECVD furnace.

PT Wholesome Announces New Product Range

PT Wholesome has recently announced their latest product range, the DURALINE Arm Hood Model DL-AH. Built with chemical-resistant components and easy to be disassembled for maintenance, the DURALINE local extractor armhood allows optimum extraction by positioning the hood close to the contaminant source.

 To find out more about the DURALINE DL-AH, visit Wholesome (S) Pte Ltd at Booth D13 this April, at Jakarta Convention Centre.